Contacts
For any information, please contact :
- Cédric Robert (cerobert@insa-toulouse.fr)
- Benjamin Lassagne (benjamin.lassagne@insa-toulouse.fr)
4 workstations dedicated to microstructure fabrication
The Exfolab gathered 4 workstations dedicated to exfoliation,
fabrication, and pre-characterization of microstructures. All are
equipped with sample holding by vacuum suction using a dry pump, as well
as temperature control via a nozzle heater from ambient temperature up
to 200 °C.
Various visualization systems are all equipped with a high-resolution scientific color camera and objectives of ×4, ×10, ×20, ×50, and ×100.
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Workstation 1
- Micropositioning: manual micrometric stages and a motorized stage along the vertical Z axis,
Sample orientation control: tip-tilt and rotation Pre-characterization: photoluminescence and reflectivity
532 nm laser LED, white LED, Ocean Optics Red Tide USB650 and Maya spectrometers, and a Princeton Acton 500 spectrometer with CCD camera
Workstations 2 and 3
- Olympus microscope stand
- Micropositioning : manual micrometric stages and a motorized stage along the vertical Z axis
Sample orientation control: tip-tilt and rotation
Workstation 4
- Environment : integrated into a glovebox under controlled nitrogen atmosphere (H2O < 0,1ppm, O2 < 0,1ppm)
- Micropositioning : motorized micrometric stages along the two sets of 3 axis (X, Y and Z for the glass slide and for the substrate)
- Sample orientation : tip-tilt and rotation
Low frequency Raman spectroscopy
The Raman spectroscopy workstation was designed and developed by the team at the laboratory, and its capabilities evolve according to experimental needs.
Main Laser sources :
λ = 532.2 nm – FWHM = 1 pm
Power range: 1 µW to 20 mW
Objectives: ×20, ×50, and ×100Wavelength ranges: 930–980 nm and 1000–1090 nm
Power range: 1 µW to 10 mW
Objective: ×50Detection: 50 cm focal-length monochromator and CCD camera
Diffraction gratings:
600 lines/mm, blazed at 1 µm
1200 lines/mm, blazed at 750 nmRaman spectral resolution: 25 cm⁻¹
Encapsulated MoS2 multilayers Raman spectrum
Atomic force microscopy (CSI Nano Explorer)
The Exfolab platform is equipped with two Nano Explorer AFM systems, one of which operates under a controlled nitrogen atmosphere.
- AFM : contact or tapping modes via piezo actuator,
- C-AFM (conductive) : current / voltage,
- EFM (Electric) : Topography (gradient of surface electric forces),
- MFM (Magnetic) : topography (gradient of surface magnetic forces),
- KPFM (Kelvin Probe) : surface potential,
- PFM (Piezoresponse) : imaging and orientation of piezoelectric domains,
- Resiscope,
KPFM (Kelvin Probe) : surface potential.
Plasma etching system (Moorfield)
- Dedicated to 2D materials,
- Low power and low flux plasma etching,
- Available gases : O2, N2, Ar, SF6.
Tubular atmosphere-controlled furnace (Carbolite Gero)
- Up to 1300°C,
- Annealing in air, under vaccuum of under inert gas.
Photolithography
Sample preparation
Fume hood suitable for the extraction of resin vapors and hazardous chemicals.
- « spin-coater » for resin,
- Ultrasonic bath,
- Hot plate,
- Chemicals and glassware.
Microlight3D Smart Print UV
- Maskless photolithography using a micromirror array (DMD), enabling direct alignment on the substrate,
- Typical resolution 2µm.
Special access to e-beam lithography at Atelier InterUniversitaire de Micro-nano Electronique (AIME) : MEB JEOL JSM-7800F with Raith Elphy module, typical resolution < 50nm
Examples of structures fabricated at the Exfolab platform
